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Reactor TCU Laboratory

分類業界ニュース 386 0

Reactor TCU Laboratory

 

The reactor tcu adopts a fully sealed design without a bath. It is dedicated to constant temperature control of external loads. It adopts a sealed design. At high temperatures, it will not produce oil mist and pungent odors to volatilize into the environment. At low temperatures, it will not absorb impurities and moisture in the ambient air. , only the heat transfer medium participates in the circulation, and the temperature of the expansion tank is always kept at a low temperature, which avoids many problems such as deterioration of the circulating medium and unfriendly environment caused by air entering the circulation system.

Mainly used in: dynamic constant temperature control of hot and cold sources such as high-pressure reactors, pilot production stainless steel reactors, double-layer glass reactors, jacketed reactors, microchannel reactors, reaction devices, combined chemistry, and low-temperature distillation in the pharmaceutical industry , distillation, extraction and other equipment, especially suitable for rapid exothermic and endothermic chemical reaction tests.

In the chemical industry, pharmaceutical industry, food processing and other fields, reactors are important equipment for realizing material reaction, purification and separation. However, traditional reactors have certain limitations in temperature control and operational flexibility. In order to solve these problems, reactor tcu came into being.

Reactor TCU is a comprehensive equipment that integrates temperature control, material reaction and separation functions. It mainly consists of the main body of the reactor, high and low temperature control system, material transportation system and exhaust gas emission system. The equipment is characterized by its high-precision temperature control and automation of the operation process, making the reaction process more stable and controllable.

 

Reactor TCU Laboratory

 

The working principle of reactor TCU is mainly realized through the high and low temperature control system. The system includes heating devices, cooling devices and temperature sensors. The heating device is responsible for heating the contents of the reaction kettle to the required reaction temperature, while the cooling device is responsible for maintaining the temperature within the reaction kettle within a certain range during the reaction process. The temperature sensor monitors the temperature in the reactor in real time and provides feedback information to the control system.

In terms of material transportation, reactor tcu adopts an automated operating system. Through pipes and valves, the input of raw materials, the output of reactants and the emission of waste gas are realized. The entire operation process does not require manual intervention, reducing operational risks and improving work efficiency.

The exhaust emission system is an important part of reactor TCU. The system includes an exhaust gas collection device, an exhaust gas treatment device and an exhaust pipe. The waste gas generated during the reaction will be collected in time and discharged through the exhaust pipe after treatment, ensuring the safety of the working environment.

Reactor TCU has a wide range of applications in actual production. For example, in the pharmaceutical industry, this equipment can be used in processes such as synthesizing drugs and extracting active ingredients; in the food processing industry, the reactor high and low temperature integrated machine can be used for food fermentation, extraction and other operations. In addition, this equipment also plays an important role in the chemical industry, new material research and development and other fields.

The application advantages of reactor tcu are mainly reflected in the following aspects:

1. A magnetically coupled high-temperature circulation pump is used to eliminate the risk of system leakage, with good sealing and high flow rate, ensuring that the equipment can exchange heat for the external system faster.

2. Only the medium in the pipeline participates in cyclic temperature control, which reduces the amount of heat transfer medium involved and improves the response speed of the system’s high and low temperature control.

3. Equipped with a user-friendly 7-inch true-color LCD touch screen, a good human-computer interaction interface, and intuitive display of local machine parameters and external temperature control parameters. Smart touch, easy to operate.

4. Design multiple sets of communication data interfaces to easily access various communication networks.

5. Reasonable layout: Frequent operations are in front of the equipment, pipeline connections are at the rear of the equipment, and the data interface is set on the side of the equipment.

6. The standard configuration is air-cooling, which requires no external water source and is simple to install and operate; the water-cooling type has stable heat dissipation efficiency and is not affected by the ambient temperature.

7. Considering the needs of chemical customers, isolation and explosion-proof and positive pressure explosion-proof models can be customized according to the customer’s equipment placement area.

8. A single device can have multiple outputs, with multiple reactors and reactor loads. Each channel can achieve independent temperature control, saving space.

Looking to the future, reactor tcu will achieve further development in the following aspects:

1. Intelligentization: With the continuous development of artificial intelligence technology, the reactor high and low temperature integrated machine will achieve more intelligent operation and improve production efficiency and quality.

2. Energy saving and environmental protection: The energy-saving design of the equipment and the application of high-tech environmental protection technology will help reduce energy consumption and environmental pollution.

3. Large-scale: In order to meet the needs of large-scale production, the scale of the reactor high and low temperature integrated machine will be further expanded to increase the single output.

4. High pressure and high temperature: In order to explore more possible chemical reactions and substance synthesis methods, the reactor high and low temperature integrated machine will develop towards high pressure and high temperature to promote the progress of scientific research.

As a multi-functional equipment, reactor TCU has wide application prospects in the chemical industry, pharmaceutical industry, food processing and other fields. With the continuous advancement of science and technology, it is believed that this kind of equipment will play a more important role in the future and make greater contributions to promoting industrial development and scientific and technological progress.

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冷暖房システム (SUNDIシリーズ)

(カスタムデザイン)

温度制御範囲:-120°C~+350°C

用途各種リアクター(マイクロチャンネル、ガラス、ジャケット付きリアクターなど)、蒸留または抽出システム、研究室、大学、研究所、航空宇宙、自動車産業、半導体および電気テスト、化学、製薬、石油化学、生化学、医療、病院、研究開発ワークショップ、航空宇宙、生物学およびその他の産業。

温度範囲 -10 ~ +150℃シリーズ -25 ~ +200℃シリーズ -25 ~ +300℃シリーズ -45 ~ +250°C シリーズ -45 ~ +300℃シリーズ -60 ~ +250°C シリーズ -60 ~ +300℃シリーズ -70 ~ +250°C シリーズ -80 ~ +250°C シリーズ-90 ~ +250°C シリーズ -100 ~ +100℃シリーズ -25 ~ +200°C 1台で2台のリアクターに対応 -40 ~ +200°C 1台で2台のリアクターに対応
冷却能力1.5 ~ 15kW1~200kW1~200kW0.45~200kW0.9 ~ 25kW0.25 ~ 60kW0.75 ~ 25kW0.4 ~ 15kW0.3 ~ 80kW0.2 ~ 80kW0.45 ~ 80kW最大10*2kW最大10*2kW

 


 

冷暖房システム(WTDシリーズ)

(カスタムデザイン)

(マイクロチャンネル・チューブリアクター特化型)

温度制御範囲:-70℃~+300

マイクロ流路に特化した設計(液体保持容量が小さく、熱交換容量が大きく、循環システムの圧力損失が高い)

 

温度範囲 -70°C ~ +300°C -45°C ~ +250°C -70°C ~ +200°C
冷却能力1.1 ~ 7.5kW1.5 ~ 5.5kW11~50kW

 


 

冷暖房サーキュレーター

(カスタムデザイン)

温度制御範囲:-45℃~+250

用途各種リアクター(マイクロチャンネル、ガラス、ジャケット付きリアクターなど)、蒸留または抽出システム、研究室、大学、研究所、航空宇宙、化学、製薬、石油化学、生化学、医療、病院、研究開発ワークショップ、航空宇宙、生物学、その他の産業。

温度範囲 -25°C ~ +200°Cシリーズ -45°C ~ +250°C シリーズ
冷却能力1 ~ 15kW0.25 ~ 15kW

 


 

加熱サーキュレーター

(カスタムデザイン)

温度制御範囲+50℃〜+300

注:UCシリーズは熱媒体の温度を制御することができる。USTシリーズは熱媒の温度を制御できるだけでなく、反応材料の温度も制御できます。

温度範囲 +50°C ~ +170°C(UCシリーズ) +50°C ~ +300°C(UCシリーズ) +50°C ~ +300°C(USTシリーズ)
暖房能力5.5 ~ 15kW3.5~130kW3.5〜95kW

 


 

TCU マルチリアクター温度制御システム

(カスタムデザイン)

温度制御範囲:-120°C~+250°C

用途各種リアクター(マイクロチャンネル、ガラス、ジャケット付きリアクターなど)、蒸留または抽出システム、研究室、大学、研究所、航空宇宙、化学、製薬、石油化学、生化学、医療、病院、研究開発ワークショップ、航空宇宙、生物学、その他の産業。

温度範囲 -45°C ~ +250°C シリーズ -120°C ~ +250°Cシリーズカスタマイズされた温度制御システムRT+10°C ~ +135°C
暖房能力25~80kW25~80kWカスタム25~300kW

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