Custom Cooling and Heating Systems for EUV(Extreme ultra-violet) Lithographic Apparatus and Chip-Making Process

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EUV (Extreme ultra-violet) lithographic apparatus heating cooling systems is a precision instrument specially used to cool lithography equipment. It is mainly composed of a compressor, condenser, evaporator, refrigerant, etc. It has the advantages of high efficiency, stability, safety, and environmental protection. It is one of the indispensable equipment in the photolithography process.

The working principle of EUV (Extreme ultra-violet) lithographic apparatus heating cooling systems mainly uses the phase change process of the refrigerant to absorb heat, thereby reducing the temperature of the lithography machine. The specific process is as follows: the compressor compresses the refrigerant into high-temperature and high-pressure vapor, and after being dissipated by the condenser, it becomes a high-temperature and high-pressure liquid; after the liquid is throttled by the expansion valve, it becomes a low-temperature and low-pressure liquid, and enters the evaporator to absorb heat and evaporate. , turns into low-temperature and low-pressure steam, thereby taking away the heat in the lithography equipment.

Advantages of EUV (Extreme ultra-violet) lithographic apparatus heating cooling systems

1. Efficient and stable: EUV (Extreme ultra-violet) lithographic apparatus heating cooling systems adopt advanced design and manufacturing processes, which can ensure long-term efficient and stable operation and effectively reduce the energy consumption cost of the lithography process.

2. Safe and reliable: EUV (Extreme ultra-violet) lithographic apparatus heating cooling systems have complete protection devices, which can effectively protect the safety of the equipment and improve the reliability and stability of the equipment.

3. Environmental protection and energy saving: EUV (Extreme ultra-violet) lithographic apparatus heating cooling systems use environmentally friendly refrigerants, which are harmless to the environment and can effectively improve the efficiency and quality of the lithography process.

EUV (Extreme ultra-violet) lithographic apparatus heating cooling systems are mainly used in semiconductor manufacturing, microelectronics manufacturing, optical manufacturing and other fields. They are used to cool precision equipment such as lithography machines and are indispensable in modern manufacturing. One of the devices.

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